Equipment Details


Name of the EquipmentRapid Thermal Processing (RTP)
GroupCrystalline Silicon Solar Cells
Categorysemi-clean pv
OperatorSandeep Kumbhar
System OwnerSandeep Kumbhar
sandeepk@ee.iitb.ac.in

Make / ModelAllwin 21/AW 610
InformationMetal Firing
Serial NumberTBA
FootPrint1m x 2m
InstallationDate01/07/2013
Equipment TypeDeposition, Growth and Annealing systems
LocationNCPRE Fab lab (2nd Floor, NanoE Building)
AMC Required
Local DealerMr. Ganga

Mr.Hari Nanovision company. Email:ganga@nanovisionapps.com, hari@nanovisionapps.com
Actual DealerAllwin21 Corp.

Allwin21 Corp. Website: http://www.allwin21.com E-Mail: sales@allwin21.com Address: 220 Cochrane Circle, Morgan Hill, CA 95037 Tel.: 1-408-778-7788 Fax: 1-408-904-7168 Cell: 1-408-887-9385
SOP SOP/64_SOP.pdf
Training & other policy documentsPOLICY/64_POLICY.pdf
Recipies
Glimpse GLIMPSE/64_GLIMPSE.pdf
Tool Facilities RequirementsN2, O2, Ar, Water, CDA
AccessControlled
Lab Phone No4489 Ext Flash 1
Substrate allowedSi wafers
Substrate DimensionMin dimension 3 inch, Max dimension 6 inch, Also some small pieces but there should not be any metal
Chemical allowedNA, Si wafers with no metal back contact (Othewise specfied) Note: Samples contaminated with Ge, Sr, Cs, Se, Ba, S, Au, Cu, Cd, Zn, Co are strictly prohibited)
Precursors/ Targets available
*Based on stock availability
NA
Precursor/ Target loaded inside toolNA
Target dimensionNA
Gases allowedN2, Ar
Contamination remarksThe processed samples will be considered as Na and K contaminated