Equipment Details


Name of the EquipmentPlasma Enhanced Chemical Vapor Deposition (PECVD)
GroupCrystalline Silicon Solar Cells
Categorysemi-clean pv
Operator
System OwnerSandeep Kumbhar
sandeepk@ee.iitb.ac.in

Irfan Khorakiwala
144076022@iitb.ac.in

Make / ModelOxford Instruments/ Plasmalab System 100
InformationDielectric coating for ARC and Passivation
Serial Number815456
FootPrint2.0 m x 1m
InstallationDate10/21/2013
Equipment TypeDeposition, Growth and Annealing systems
LocationNCPRE Fab lab (2nd Floor, NanoE Building)
AMC Required
Local DealerOxford India

Gurupal Singh, Oxford Instruments India.
Actual DealerOxford Instruments

Michael.STOKELEY@oxinst.com
SOP SOP/62_SOP.pdf
Training & other policy documentsPOLICY/62_POLICY.pdf
Recipies RECEPIES/62_RECEPIES.pdf
Glimpse GLIMPSE/62_GLIMPSE.pdf
Tool Facilities RequirementsSiH4, NH3, N2, Ar, He, H2, N2O,Water
AccessOpen
Lab Phone No4489 Ext Flash 1
Substrate allowedSi, Quartz
Substrate DimensionPieces to 8 inch wafers
Chemical allowedNA, Si, SiN, SiO2, borosilicate glass
Precursors/ Targets available
*Based on stock availability
NA
Precursor/ Target loaded inside toolNA
Target dimensionNA
Gases allowedSiH4, NH3, N2, Ar, He, H2, N2O
Contamination remarksAny other sample beyond the mentioned list needs due contamination clearance