Equipment Details


Name of the EquipmentLaser Doping System
GroupCrystalline Silicon Solar Cells
Categoryclean
OperatorSwasti Bhatia
System OwnerSwasti Bhatia
154076021@iitb.ac.in

NCPRE
ncpreit@ee.iitb.ac.in

Make / ModelScantech Laser Pvt. Ltd.
InformationLaser firing on spin-on-dopants
Serial NumberNA
FootPrint1 m X 1.5 m
InstallationDate04/01/2012
Equipment TypeMiscellaneous
LocationNCPRE Char lab (3rd Floor, NanoE Building)
AMC Required
Local DealerAnant Deshpande

Anant Deshpande, TTC Industrial Area, MIDC, Mahape, Navi Mumbai, anant@laserscience.in, 022-4155-3232
Actual DealerLaser Science Services (I) Pvt. Ltd.

Anant Deshpande, TTC Industrial Area, MIDC, Mahape, Navi Mumbai, anant@laserscience.in, 022-4155-3232
SOP SOP/59_SOP.pdf
Training & other policy documentsPOLICY/59_POLICY.pdf
Recipies RECEPIES/59_RECEPIES.pdf
Glimpse GLIMPSE/59_GLIMPSE.pdf
Tool Facilities RequirementsN2
AccessOpen
Lab Phone No4489 Ext Flash
Substrate allowedSilicon
Substrate DimensionMaximum 4 inch
Chemical allowedNA, c-Si, mc-Si, SiN, SiO2, Glass
Precursors/ Targets available
*Based on stock availability
NA
Precursor/ Target loaded inside tool
Target dimensionNA
Gases allowedPN2
Contamination remarksHigh power density involved, material should withstand high laser power, sample should not produce fumes hazards, only c-silicon material based samples without any metals are allowed at this point but metal containing samples can be consulted