Equipment Details


Name of the Equipment2 inch phosphorus diffusion
GroupCrystalline Silicon Solar Cells
Categoryclean
OperatorSaima Cherukat
System OwnerSaima Cherukat
154076019@iitb.ac.in

Make / Model
Information
Serial NumberNA
FootPrintNA
InstallationDate
Equipment TypeDeposition, Growth and Annealing systems
LocationNCPRE Fab lab (2nd Floor, NanoE Building)
AMC Not Required
Local DealerUrjas Energy Solutions

Urjas Energy Solutions www.urjas.com Tel:+91 022 28620267 Pradeep Kumar Podal : 9870999679 Devendra Pareek : 8879180221
Actual DealerUrjas Energy Solutions

Urjas Energy Solutions www.urjas.com Tel: +91 022 28620267
SOP SOP/1_SOP.pdf
Training & other policy documentsPOLICY/1_POLICY.pdf
Recipies
Glimpse GLIMPSE/111_GLIMPSE.pdf
Tool Facilities RequirementsN2, O2 supply, Exhaust
AccessOpen
Lab Phone No4489 Ext Flash 1
Substrate allowedSi
Substrate Dimension2 inch Maximum, Quarter of 2 inch Minimum
Chemical allowedPhosphorus Dopant Paste, Si
Precursors/ Targets available
*Based on stock availability
NA
Precursor/ Target loaded inside toolNA
Target dimensionNA
Gases allowedN2 , O2
Contamination remarksRCA cleaned wafers are only allowed. The furnace is used for diffusion of screen printed phosphorus paste.